Introducing the...

next generation, no watermarks, clean-rinse-dry system.

The state-of-the-art Gradient Dryer� uses the difference between the surface tension of H2O and alcohol to produce a gradient that generates fast and effective drying of substrates.

Surface tension gradient drying yields substrates that are watermark-free with low particle counts.
Since there are no metallic components inside the dryer chamber, charge damage is virtually eliminated.
With no moving parts and essentially no mechanical stresses, the elimination of spin-drying dramatically reduces wafer breakage.

When integrated with cleaning and rinsing, this patented, "green" tool can provide an environmentally friendly process for drying of ICs, solar cells, fuel cells, MEMS, and disk drives. The Gradient Dryer can process a variety of substrate types and sizes in numerous batch configurations with no post treatment of effluents. The dryers can be produced as stand alone units or integrated into wet processing stations.

The Gradient Dryer� is designed and manufactured by Silicon Valley-based Gradient Technology, Inc. [ LEARN MORE ]

website by infolane