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Gradient Technology, Inc, has introduced The Gradient Dryer™, a batch surface tension gradient dryer that will dry a variety of substrates including III-V Semiconductors, MEMS, solar Cells, fuel cells as well as ICs. The Gradient Dryer™ module is an option on the industry-proven Gradient Technology, Inc, wet process stations that serves multiple cleaning applications.
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| The Gradient Dryer™ |
| Gradient Technology, Inc, Key Advantages | |
|---|---|
| Feature | Impact |
| Next generation system | State of art electronics
Safety interlocks |
| Flexible, intuitive, recipe driven software | MFC's and all flows are under software control |
| Wafer and process chamber w/o moving parts | No particle generation
No substrate breakage |
| Tank and lid design
Flexible air nozzle configuration |
Optimized based on wafer size, type, and cassette type |
| Patented surface tension gradient effect | Use Only 10ml IPA per batch
No disposal required Unmatched cleaning Watermark free |
| High aspect ratio features dried | Significant device impact |
| New generation software
100 recipe capacity |
Complete flexibility
Significant timesavings Reduced set-up |
| Simulated process visibility | Elimination of pilot error |
| Ergonomic design | Capture of all vapors |
| Custom experience based flexible fixturing | Optimum quality drying |
| Elimination of metal corrosion sources | Closed lid eliminates light
Static discharge elements in design Essentially no remaining water on substrates Cool, room temperature process |
| Local support
Process Engineering Service |
Applications support
Local customization Response quality, time |
| COO Optimized | Multiple carriers
Form-fit with SRD's Expandability to 8" Reconfigurable from dual 4" to single 8" |
| Maintainability | Access to subsystems both front and back
Quick access to electrical cabinet Separation of key subsystems System maintenance access through software |
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copyright © 2008 all rights reserved |
www.gradientprocess.com |
Telephone
510 824-0035 |